Submicron metrology in the semiconductor industry-Reference-Cited by-同舟云学术

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Submicron metrology in the semiconductor industry

Published:1992-03 Issue:3 Volume:35 Page:391-402
ISSN:0038-1101
Container-title:Solid-State Electronics
language:en
Short-container-title:Solid-State Electronics

Author:

Corle Timothy R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference46 articles.

1. Submicrometer microelectronics dimensional metrology: scanning electron microscopy

2. 1986 Annual Book of ASTM Standards,1986

3. ASTM Manual on Presentation of Data and Control Chart Analysis, STP15D, American Society for Testing and Materials, Philadelphia

4. THE FUTURE of manufacturing with OPTICAL MICROLITHOGRAPHY

5. Optical Microlithography IV;Kirk,1985

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Increasing the accuracy of diffractometric measurement of microrelief in integrated circuits;Measurement Techniques;1998-03

2. Applications;Confocal Scanning Optical Microscopy and Related Imaging Systems;1996

3. Metrology of subwavelength photoresist gratings using optical scatterometry;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-07

4. Polarization-enhanced imaging of photoresist gratings in the real-time scanning optical microscope;Applied Optics;1994-02-01

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