On the Monte Carlo simulation program “RESIS” for electron exposure of resists
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
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1. Simulation of Electron Beam Exposure and Resist Processing for Nano-Patterning;Nanofabrication;2011-10-04
2. Electron Beam Lithography Simulation for the Patterning of Extreme Ultraviolet Masks;Japanese Journal of Applied Physics;2008-06-20
3. Resist debris formation and proximity exposure effect in electron beam lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000
4. Resist debris formation in electron beam lithography;Vacuum;1999-04
5. Phenomenon of resist debris formation in electron beam lithography and its possible application;Vacuum;1996-11
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