Computer aided optimization of ion implantation impurity profiles for n+npp+ double drift IMPATT diodes with three moment approach
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference12 articles.
1. Millimeter-Wave Silicon IMPATT Sources and Combiners for the 110-260-GHz Range
2. Millimeter-Wave CW IMPATT Diodes and Oscillators
3. Ion-implanted planar-mesa IMPATT diodes for millimeter wavelengths
4. The Influence of the Amorphous Phase on Ion Distributions and Annealing Behavior of Group III and Group V Ions Implanted into Silicon
5. Estimation of impurity profiles in ion‐implanted amorphous targets using joined half‐Gaussian distributions
Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Optimization of Ion Implanted Low-High-Low Impurity Profile for Silicon n+pp+SDR Diode;IETE Technical Review;1998-01
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