Characterization of indium tin oxide surfaces after KOH and HCl treatments-Reference-Cited by-同舟云学术

Characterization of indium tin oxide surfaces after KOH and HCl treatments

Published:2008-04 Issue:2 Volume:9 Page:253-261
ISSN:1566-1199
Container-title:Organic Electronics
language:en
Short-container-title:Organic Electronics

Author:

Gardonio S.,Gregoratti L.,Scaini D.,Castellarin-Cudia C.,Dudin P.,Melpignano P.,Biondo V.,Zamboni R.,Caria S.,Kiskinova M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Condensed Matter Physics,General Chemistry,Biomaterials,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Dark spot formation relative to ITO surface roughness for polyfluorene devices

2. A photoelectron spectroscopy study on the indium tin oxide treatment by acids and bases

3. Surface electronic structure of plasma-treated indium tin oxides

4. Enhancement of optical properties in organic light emitting diodes using the Mg–Al alloy cathode and IrOx-coated indium tin oxide anode

5. Surface chemistry of carbon removal from indium tin oxide by base and plasma treatment, with implications on hydroxyl termination

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