Hydrogen peroxide potentiates antimicrobial photodynamic therapy in eliminating Candida albicans and Streptococcus mutans dual-species biofilm from denture base
Author:
Publisher
Elsevier BV
Subject
Pharmacology (medical),Dermatology,Oncology,Biophysics
Reference47 articles.
1. Epidemiology and etiology of denture stomatitis;Gendreau;J Prosthodont.,2011
2. Candida albicans Biofilms and Human Disease;Nobile;Annu Rev Microbiol.,2015
3. Early Adhesion of Candida albicans onto Dental Acrylic Surfaces;Aguayo;J Dent Res.,2017
4. Denture plaque and adherence of Candida albicans to denture-base materials in vivo and in vitro;Radford;Crit Rev Oral Biol Med.,1999
5. Biofilms: an emergent form of bacterial life;Flemming;Nat Rev Microbiol.,2016
Cited by 18 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Evaluation of quantification methods to determine photodynamic action on mono- and dual-species bacterial biofilms;Photochemical & Photobiological Sciences;2024-05-04
2. Indium porphyrin - colloidal activated carbon composites for photocatalytic activity against an organic pollutant and bacteria;Polyhedron;2024-05
3. Antimicrobial photodynamic therapy against a dual-species cariogenic biofilm using a ruthenium-loaded resin-based dental material;Photodiagnosis and Photodynamic Therapy;2024-04
4. Simultaneous Dual-Wavelength Laser Irradiation against Implant-Adherent Biofilms of Staphylococcus aureus, Escherichia coli, and Candida albicans for Improved Antimicrobial Photodynamic Therapy;Bioengineering;2024-01-02
5. Photodynamic treatment of Staphylococcus aureus with non-iron hemin analogs in the presence of hydrogen peroxide;RSC Medicinal Chemistry;2024
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3