Author:
Goodall Francis N.,Lawes Ronald A.,Arthur Graham G.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference4 articles.
1. Reduction Photolithography by Ablation at wavelength 193 nm;Optics Communications,1986
2. Excimer Lasers as Deep UV Sources for Photolithographic System;Goodall;Microcircuit Engineering 1986,1986
3. Excimer Laser Lithography;Goodall;Proc. Advanced Lithography. Inst. Phys. Short Meeting Series No. 10,1988
Cited by
9 articles.
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