To dye or not to dye - some aspects of today's resist technology --Reference-Cited by-同舟云学术

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To dye or not to dye - some aspects of today's resist technology -

Published:1985-12 Issue:1-4 Volume:3 Page:321-328
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Bolsen M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Factors affecting Line Width Control including Multiple Wavelength Exposure and Chromatic Aberration;Neureuther;SPIE,1981

2. Modelling Positive Photoresist;Dill,1975

3. Principles of Optical Lithography;King,1981

4. Linewidth Control in Optical Projection Printing: Influence of Resist Parameters;Arden;SPIE,1985

5. Optical Lithography;Dill;IEEE Trans. of Electron Devices,1975

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deep ultra-violet measurements of SiON anti-reflective coatings by spectroscopic ellipsometry;Thin Solid Films;1998-02

2. The Application of Heavily Dyed Photoresist to Wafer Production;Journal of The Electrochemical Society;1988-02-01

3. Commercial dyes for novolak based multilayer systems;Microelectronic Engineering;1986-12

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