X-ray lithography-Reference-Cited by-同舟云学术

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X-ray lithography

Published:1985-12 Issue:1-4 Volume:3 Page:535-556
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Heuberger A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. H. Bohlen, W. Kulcke et al: “Electron-Beam Proximity Printing” IBM Journal, Vol. 26

2. Proximity Corrections for Electron Image Projection;Nicholas,1985

3. An Electron Beam Image Projection System with Automatic Wafer Handling;Mori,1985

4. Submicron Lithography and DUV-Master-Masks Made by Ion Projection;Maurer,1985

5. Membrane Mask Considerations in Ion Beam Lithography;Bartelt;The Electrochem. Abstracts,1982

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of subsurface defects structural evolution in nano electro machining of copper;Materials Today Communications;2022-12

2. Single molecule analysis in nanofluidic devices;Spectroscopy and Dynamics of Single Molecules;2019

3. Introduction: LIGA and Its Applications;LIGA and Its Applications;2008-11-26

4. High efficiency photoresist-free lithography of UO3 patterns from amorphous films of uranyl complexes;Journal of Materials Research;1998-05

5. The Key Role of Electron Beams in IC Technology;Application of Particle and Laser Beams in Materials Technology;1995

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