Author:
Menschig A.,Forchel A.,Dammel R.,Lingnau J.,Scheunemann U.,Theis J.,Pongratz S.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. 8 nm Wide Line Fabrication in PMMA on Si Wafers by Electron Beam Exposure
2. Fabrication of nanometer width GaAs/AlGaAs and InGaAs/InP quantum wires
3. Electron beam technology in microfabrication;Brewer,1980
4. B. Maile, A. Forchel, R. Germann, A. Menschig, H.P. Maier, D. Grützmacher, J. Vac. Sci. Technol. B, to be published.
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献