Author:
Nomura N.,Yamashita K.,Endo M.,Sasago M.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. Extended Abstract of the 1991 Int. Conf. on Solid State Devices and Materials;Sasago,1991
2. ArF quarter-micron projection lithography with an aspherical lens system
3. Proc. SEMICON/Kansai-Kyoto 92 Technology Seminor;Gargini,1992
4. Improving resolution in photolithography with a phase-shifting mask
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Deep-UV Microlithography;Ultraviolet Laser Technology and Applications;1995
2. Laser chemical processing of magnetic materials for recording-head application;Applied Physics A Solids and Surfaces;1994-04