Author:
Louis E.,Bijkerk F.,Shmaenok L.,Voorma H.-J.,van der Wiel M.J.,Schlatmann R.,Verhoeven J.,van der Drift E.W.J.M.,Romijn J.,Rousseeuw B.A.C.,Voβ F.,Desor R.,Nikolaus B.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Proc. 21st European Conf. on Laser Interaction with Matter;Louis,1991
2. Osa Proc. on Soft X-ray Projection Lithography 12;Rockett,1991
3. Performance optimization of a high-repetition-rate KrF laser plasma x-ray source for microlithography
4. Design of an extended image field soft-x-ray projection system
5. Osa Proc. on Soft X-ray Projection Lithography 12;Kubiak,1991
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