Electron beam decomposition of carbonyls on silicon-Reference-Cited by-同舟云学术

Electron beam decomposition of carbonyls on silicon

Published:1986-12 Issue:1-4 Volume:5 Page:423-430
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Scheuer Volker,Koops Hans,Tschudi Theo

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. New selective deposition technology by electron beam induced surface reaction;Matusi;29th Symp. on Electron, Ion and Photon Beams, Portland, Oregon,1985

2. Formation of Thin Polymer Films by Electron Bombardment;Christy;J. Appl. Phys.,1960

3. Materials and techniques used in nanostructure fabrication;Broers;J. Vac. Sci. Technol.,1979

4. Trockene Resist Verfahren;Fritzsche,1984

5. Electron Beam Decomposition of CdC12;Mino;J. Appl. Phys.,1985

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