Author:
Huq S.E.,Prewett P.D.,Herman P.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. High sensitive x-ray and electron-beam resists using chemical amplification;Dammel,1990
2. Characterisation of AZPN114 resist for high resolution using electron beam and soft x-ray projection lithography;Early;J. Vac. Sci. Technol. B,1992
3. Process latitude for the chemical amplification resists AZPF514 and AZPN114;Eckes,1991
4. Recent trends in x-ray resists;Lingnau;Solid State Technol.,1989
5. Chemical amplification mechanisms for microlithography