New KrF and ArF excimer laser for advanced DUV lithography-Reference-Cited by-同舟云学术

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New KrF and ArF excimer laser for advanced DUV lithography

Published:1995-02 Issue:1-4 Volume:27 Page:221-224
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Endert H.,Pa¨tzel R.,Powell M.,Rebhan U.,Basting D.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. Wakabayashi et al, German patent DE 389093, 1989

2. N. Furuya, T. Ono, N. Horiuchi, K. Yamanaka, and T. Miyata, US patent 5,150,370, 1992

3. N. Nishida, US patent 5,107,515, 1990

4. SPIE Microlithography '93;Sengupta,1993

5. Plating and Surface Finishing 6'93;Bodnevas,1993

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