Low energy lithography; energy control and variable energy exposure-Reference-Cited by-同舟云学术

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Low energy lithography; energy control and variable energy exposure

Published:1995-02 Issue:1-4 Volume:27 Page:135-138
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Bru¨nger W.,Kley E.-B.,Schnabel B.,Stolberg I.,Zierbock M.,Plontke R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. Compound magnetic and electrostatic lenses for low-voltage applications

2. Verification of a proximity effect correction program in electron‐beam lithography

3. BO¨TTCHER, M. et al. EIPB'94, paper F4(in press)

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4. Fundamentals of Electron Beam Exposure and Development;Nanofabrication;2011-10-04

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