Evaluation of x-ray resists for submicron lithography-Reference-Cited by-同舟云学术

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Evaluation of x-ray resists for submicron lithography

Published:1987-12 Issue:1-4 Volume:6 Page:519-525
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Redaelli R.,Wells G.M.,Cerrina F.,Crapella S.,Vento G.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. G.M.Wells, B.Lai,D.So,R.Redaelli,and F.Cerrina SRI 1987, proceedings North-Holland, Amsterdam, in print.

2. L.Pan,P.King,P.Pianetta SRI 1987 ,proceedings North-Holland ,Amsterdam in print.

3. C.M.Meager, D.W.Pearson,P.M.De Luca,G.M.Wells,R.Redaelli,F.Cerrina SRI 1987, Proceedings, North-Holland Amsterdam in print.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The convergence of top-down and bottom-up nanofabrication: formation of 3D structures;SPIE Proceedings;2005-01-19

2. Effects of molecular weights and polydispersity on the properties of poly(trifluoroethyl methacrylate) as a positive x ray and electron resist;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1990-01

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