Author:
Weigmann U.,Burghause H.,Schaffer H.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference4 articles.
1. P. Sudraud, U. Weigmann, unpublished.
2. Simulation of focused ion beam milling;Müller,1986
3. H. Betz, A. Heuberger, N.P. Economou, D.C. Shaver: Influence of Sputter Effects on the Resolution in X-ray Mask Repair, SPIE Conference 1986 on Electron Beam, X-Ray, and Ion Beam Techniques for Submicrometer Lithography, Santa Clara, March 11th.
4. Untersuchungen zur Festkörperzerstäubung bei schiefwinkligem Ionenbeschuβ polykristalliner Metalloberflächen im Energiebereich um 1 keV;Oechsner;Z. Physik,1973
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