Ultra clean processing-Reference-Cited by-同舟云学术

Ultra clean processing

Published:1991-02 Issue:3-4 Volume:10 Page:163-176
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Ohmi Tadahiro

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference56 articles.

1. Soft and clean technologies for submicron LSI;Ohmi,1988

2. Super clean room system-Ultra clean technology for submicron LSI fabrication;Ohmi;ULSI Sci. Technol.,1987

3. RF-DC coupled mode bias sputtering for ULSI metallization;Ohmi;ULSI Sci. Technol.,1987

4. Ultra clean gas delivery system for ULSI fabrication and its evaluation;Ohmi;ULSI Sci. Technol.,1987

5. Ultraclean technology: ULSI processing's crucial factor;Ohmi;Microcontamination,1988

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