1. Dry etching for high resolution mask making;Tedesco,1990
2. New deep UV source for microlithography;Ury,1982
3. Negative aqueous developable electron-beam resist under deep UV exposure;Amblard,1989
4. X-ray microscope images with Fresnel zone plates fabricated by electron beam nanolithography;Unger,1987
5. Concept of buried mask and its realization;Panabière,1989