1. Result of European Mask Workshop,1989
2. Submicron Patterning Techniques for Integrated Circuits;Beinvogl,1990
3. Study of Influence of Silylation Conditions on the Silicon Contrast;Goethals;Microcircuit Engineering,1990
4. Physical and Technological Limits in Optical and X-Ray Lithography;Arden;Microelectronic Engineering,1987
5. 31st International Symposium on Electron, Ion and Photon Beams;Heuberger,1987