Optical versus X-ray lithography for future device fabrication-Reference-Cited by-同舟云学术

Optical versus X-ray lithography for future device fabrication

Published:1991-03 Issue:1-4 Volume:13 Page:231-241
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Arden Wolfgang

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Result of European Mask Workshop,1989

2. Submicron Patterning Techniques for Integrated Circuits;Beinvogl,1990

3. Study of Influence of Silylation Conditions on the Silicon Contrast;Goethals;Microcircuit Engineering,1990

4. Physical and Technological Limits in Optical and X-Ray Lithography;Arden;Microelectronic Engineering,1987

5. 31st International Symposium on Electron, Ion and Photon Beams;Heuberger,1987

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