Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference11 articles.
1. J.Z.Y. Guo, G. Chen, V. White, P. Anderson, and F. Cerrina, J. Vac. Sci. Technol., in print.
2. Design parameters for a small storage ring optimized as an x-ray lithography source
3. R. Redaelli and F. Cerrina, Vuoto XVII; 11.
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Synchrotron radiation x-ray lithography beamline optics alignment using the Hartmann method;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
2. The center for X-ray lithography facility status and beamlines development;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1994-08
3. Evaluation of beryllium foils for x-ray lithography beamlines;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11
4. Metrology for replicated x-ray masks using an electron-beam machine;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11
5. Design Optimization of Synchrotron Radiation Lithography Beamline for a Compact Storage Ring;Japanese Journal of Applied Physics;1992-12-30