Integrated processing of amorphous and microcrystalline Si thin film transistors by plasma-assisted chemical-vapor deposition-Reference-Cited by-同舟云学术

Integrated processing of amorphous and microcrystalline Si thin film transistors by plasma-assisted chemical-vapor deposition

Published:1994-08 Issue:2-4 Volume:25 Page:329-336
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Lucovsky G.,He S.S.,Williams M.J.,Stephens D.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Flat panel displays using amorphous and microcrystalline semiconductor devices;Suzuki,1991

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