Fabrication of DFB laser gratings using synchrotron radiation proximity lithography-Reference-Cited by-同舟云学术

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Fabrication of DFB laser gratings using synchrotron radiation proximity lithography

Published:1992-03 Issue:1-4 Volume:17 Page:551-554
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Gentili M.,Grella L.,Baciocchi M.,Kumar R.,Meneghini G.,Plumb D.,Leonard Q.,Cerrina F.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. 1.5 μm phase adjusted active distributed reflector laser for complete dynamic single-mode operation

2. λ/4-shifted InGaAsP/InP DFB lasers by simultaneous holographic exposure of positive and negative photoresists

3. AlGaAs/GaAs distributed feedback lasers with first‐order grating fabricated by metalorganic chemical vapor deposition

4. Fabrication of second-order gratings for 1.55μm DFB lasers using deep UV lithography

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