Contribution to the study of polysilanes for high-resolution photolithography-Reference-Cited by-同舟云学术

Contribution to the study of polysilanes for high-resolution photolithography

Published:1988-08 Issue:1-2 Volume:8 Page:55-78
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Rosilio C.,Rosilio A.,Serre B.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Contrast enhanced photolithography;Griffing;IEEE Electron Dev. Lett.,1983

2. High resolution pattern transfer by dry etching;Lehmann,1980

3. Double layer resist systems for high resolution lithography;Hatzakis,1981

4. Silicon containing resists for bi-layer resist systems;Ohnishi;SPIE Advances in Resist Technology and Processes,1985

5. Copolymers of trimethylsilylstyrene with chloromethylstyrene for a bi-layer resist system;Suzuki;J. Electrochem. Soc.,1983

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