Author:
Assayag G.Ben,Sudraud P.,Gierak J.,Remiens D.,Menigaux L.,Dugrand L.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
12 articles.
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1. Design and realization of a very high-resolution FIB nanofabrication instrument;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1999-05
2. Very high-resolution focused ion beam nanolithography improvement: A new three-dimensional patterning capability;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999
3. Modification of semiconductor laser diodes by focused ion beam milling;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1997-05
4. Focused ion beam nanolithography on AlF3 at a 10 nm scale;Applied Physics Letters;1997-04-14
5. Determination of the spring constants of probes for force microscopy/spectroscopy;Nanotechnology;1996-09-01