Author:
Rousseaux F.,Haghiri-Gosnet A.M.,Khan Malek C.,Kebabi B.,Launois H.,Durand J.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
9 articles.
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1. X-ray Lithography;Nano-Lithography;2013-03-07
2. Masks for high aspect ratio x-ray lithography;Journal of Micromechanics and Microengineering;1996-06-01
3. Tungsten trench etching in a magnetically enhanced triode reactor;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-03
4. Resolution limits and process latitude of x-ray mask fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11
5. 100 kV thermal field emission electron beam lithography tool for high-resolution x-ray mask patterning;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-11