Accurate nano-EB lithography for 40-nm gate MOSFETs
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. Y. Taur et al: IEDM93 Technical Digest, p.127.
2. K.F. Lee et al: ibid. p.131.
3. M. Ono et al: ibid. p.119.
4. Symp. VLSI Tech;Takeuchi,1995
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