Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference32 articles.
1. Rf-sputter-etching in fluoro-chloro-hydrocarbon gases;Hosokawa,1974
2. Plasma etching in semiconductor manufacture—a review;Reinberg;Proc. ECS,1981
3. Plasma etching of films at high rates;Heinecke;Sol. State Techn.,1978
4. Plasma etching of Al;Reichelderfer;ECS Abstr.,1977
5. Reactive ion etching of aluminium and aluminium alloys in an rf-plasma containing halogen species;Schaible;J. Vac. Sci. Technol.,1978
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