X-Ray photoelectron spectroscopy study of phosphorus silicate glasses-Reference-Cited by-同舟云学术

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X-Ray photoelectron spectroscopy study of phosphorus silicate glasses

Published:2002-11 Issue:1 Volume:161 Page:11-19
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Beshkov G.,Krastev V.,Grigorov K.,Maciel H.,Tang Ting-Ao,Huang Veining

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference27 articles.

1. Interatomic Distances and Bond Character in the Oxygen Acids and Related Substances

2. The Stability of SiO Solid and Gas

3. Mass Spectrometric Study of Gaseous Species in the Si‐SiO2 System

4. Die Siliciummonoxyd-Drucke �ber den festen Bodenk�rpern Silicium und Siliciumdioxyd Mit 7 Abbildungen

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermal poling induced second-order optical nonlinearity in phosphosilicate glass thin films;Journal of Modern Optics;2019-11-15

2. Functionalization of phosphocalcic bioceramics for bone repair applications;Materials Science and Engineering: C;2019-02

3. Chemical analysis of silica doped hydroxyapatite biomaterials consolidated by a spark plasma sintering method;Journal of Inorganic Biochemistry;2007-02

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