Author:
Reschke J.,Goedicke K.,Junghähnel M.,Frach P.,Mark G.
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference8 articles.
1. Pulss magnetron sputter technology;Schiller;Surf. Coat. Technol.,1993
2. Improved control of tin coating properties using cathodic arc evaporation with a pulsed bias;Oibrich;Surf. Coat. Technol.,1991
3. Pulsed-DC Reactive Sputtering — New Opportunities;Graham,1994
4. Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering;Frach;Surf. Coat. Technol.,1993
5. Potentials of the pulse magnetron sputter technology (PMST), paper presented at the Seventh;Schiller,1993
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