Selection of metalorganic precursors for MOCVD of metallurgical coatings: application to Cr-based coatings
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference49 articles.
1. Non-hydride group V sources for OMVPE
2. Organometallic molecular precursors for low-temperature MOCVD of III-V semiconductors
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