Addendum to ‘‘Modeling of temperature fields in the graphite target at pulsed laser deposition of CN films’’

Author:

Skrzypczak M,Bertrand P,Zdanowski J,Pawlowski L

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference5 articles.

1. Synthèse d'un dépôt CNx polycristallin par l'ablation laser dans l'atmosphère d'azote en postdécharg;Alkhawwam;Galvano Organo Traitements de Surface,2000

2. C. Jama, O. Dessaux, N. Duez, C. Dupret, P. Goudmand, L. Gengembre, J. Grimblot, Formation of carbon nitrides CNx films assisted by TEA CO2 laser ablation graphite in a remote nitrogen plasma, Proceedings 12th ITSC, Minneapolis, 1995, pp. 2197–2202.

3. Carbon nitride CNx films deposition assisted by infrared laser ablation in a cold remote plasma;Jama;Thin Solid Films,1997

4. Cold remote nitrogen plasma effects on pulsed laser deposited CNx characteristics;Jama;Carbon,1998

5. Structural and micromechanical studies of CNx films deposited on silicon substrates in a remote nitrogen plasma;Jama;Surf. Coat. Technol.,1999

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