Modeling the stability of reactive sputtering processes
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference16 articles.
1. Different pulse techniques for stationary reactive sputtering with double ring magnetron
2. Transparent conducting zinc oxide and indium–tin oxide films prepared by modified reactive planar magnetron sputtering
3. Reactive ion plating of TiO2
4. The effect of target-substrate coupling on reactive direct current magnetron sputtering
5. High rate reactive sputtering process control
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2. Tutorial: Hysteresis during the reactive magnetron sputtering process;Journal of Applied Physics;2018-12-28
3. Determination of Reactive RF-Sputtering Parameters for Fabrication of SiOx Films With Specified Refractive Index, for Highly Reflective SiOx Distributed Bragg Reflector;IEEE Photonics Journal;2017-02
4. Deposition of rutile TiO2 films by pulsed and high power pulsed magnetron sputtering;Surface and Coatings Technology;2016-05
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