Measured and calculated retained dose with different process parameters in plasma based ion implantation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference13 articles.
1. Overview of plasma source ion implantation research at University of Wisconsin–Madison
2. Comparison between conventional and plasma source ion‐implanted femoral knee components
3. Ion beam assisted coating and surface modification with plasma source ion implantation
4. Shallow junction formation by plasma immersion ion implantation
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. FDTD study of the effects of the doubly ionized ions on the plasma immersion ion implantation process;Journal of Plasma Physics;2014-01-15
2. Simulation and dose uniformity analysis of plasma based ion implantation;Journal of Physics D: Applied Physics;2005-12-02
3. Modelling and experiment of plasma-based ion-implanted two-dimensional target;Modelling and Simulation in Materials Science and Engineering;2004-01-07
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