Mechanical and electrical properties of fcc TiO1+x thin films prepared by r.f. reactive sputtering

Author:

Bally A.R,Hones P,Sanjinés R,Schmid P.E,Lévy F

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference14 articles.

1. A review of the present state of art in hard coatings grown from the vapor phase

2. B. Milosev, H.-H. B. Navinsek, Strehblow, Corrosion properties of hard PVD nitride coatings (with the emphasis on TiN), in: Scientific Series of the International Bureau, vol. 37, Forschungszentrum Jülich GmbH, 1995.

3. G.V. Samsonov, I.M. Vimitskii, Handbook of Refractory Compounds, IFI/Plenum, New York, 1980.

4. G.V. Samsonov, The Oxide Handbook, IFI/Plenum, New York, 2nd ed., 1982.

5. Electrical and optical properties of TiO2anatase thin films

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