Low-pressure, high-density plasma nitriding: mechanisms, technology and results-Reference-Cited by-同舟云学术

Low-pressure, high-density plasma nitriding: mechanisms, technology and results

Published:1998-10 Issue: Volume:108-109 Page:182-190
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Czerwiec T.,Michel H.,Bergmann E.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference103 articles.

1. W.L. Kovacs, in: T. Spalvins, W.L. Kovacs (Eds.), Proc. of the 2nd Int. Conf. on Ion Nitriding/Carburizing, Cincinnati, OH, 18–20 September 1989, p. 5.

2. W. Rembges, J. Luhr, in: T. Spalvins, W.L. Kovacs (Eds.) Proc. of the 2nd Int. Conf. on Ion Nitriding/Carburizing, Cincinnati, OH, 18–20 September 1989, p. 147.

3. Plasma nitriding in industry—problems, new solutions and limits

4. F. Hombeck, in: T. Spalvins, W.L. Kovacs (Eds.), Proc. of the Int. Conf. on Ion Nitriding, Cincinnati, OH, 15–17 September 1986, p. 169.

5. Progress in the analysis of the mechanisms of ion nitriding

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