Growth of amorphous SixC1−x thin films using a methane–silane high energy ion beam-Reference-Cited by-同舟云学术

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Growth of amorphous SixC1−x thin films using a methane–silane high energy ion beam

Published:1999-12 Issue:1 Volume:122 Page:51-55
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Halac E.B,Huck H,Oviedo C,Reinoso M.E,de Benyacar M.A.R

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference7 articles.

1. Characterization of hard amorphous carbon films deposited with high-energy ion beams

2. Structure and thermal behavior of N containing a-C films obtained by high energy ion beam deposition

3. XIV Congresso Brasileiro de Engenharia Mecanica, San Pablo, Brazil;Huck,1997

4. Effects of thermal and laser annealing on silicon carbide nanopowder produced in radio frequency glow discharge

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