Applications of plasma immersion ion implantation in microelectronics — a brief review
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference49 articles.
1. Plasma source ion‐implantation technique for surface modification of materials
2. Plasma immersion ion implantation using plasmas generated by radio frequency techniques
3. Plasma immersion ion implantation—a fledgling technique for semiconductor processing
4. New doping method for subhalf micron trench sidewalls by using an electron cyclotron resonance plasma
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1. Influence of bias voltage rise time, pressure and magnetic field on the boundary layer time evolution of a thermal collisional magnetized plasma in plasma immersion ion implantation;The European Physical Journal D;2024-07
2. Review on recent advances in cold plasma technology;The European Physical Journal Applied Physics;2022
3. Time-resolved evolution of plasma parameters in a plasma immersion ion implantation source;Physics of Plasmas;2021-12
4. 3D Ordered Macroporous VO 2 Thin Films with an Efficient Thermochromic Modulation Capability for Advanced Smart Windows;Advanced Optical Materials;2019-08-20
5. Enhanced osteogenic activity of poly ether ether ketone using calcium plasma immersion ion implantation;Colloids and Surfaces B: Biointerfaces;2016-06
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