Kinetics and microstructure of TiN coatings by CVD
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference20 articles.
1. Growth and Properties of LPCVD Titanium Nitride as a Diffusion Barrier for Silicon Device Technology
2. Kinetical Aspects of the LPCVD of Titanium Nitride from Titanium Tetrachloride and Ammonia
3. Handbook of Chemical Vapor Deposition, Principles, Technology and Applications;Pierson,1992
4. Properties and microelectronic applications of thin films of refractory metal nitrides
5. A REVIEW OF THE CHEMICAL VAPOR DEPOSITION (CVD) OF THE REFRACTORY COMPOUNDS OF TITANIUM - A UNIQUE FAMILY OIF COATINGS
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