The effect of work function during electron spectroscopy measurements in Scanning Field-Emission Microscopy-Reference-Cited by-同舟云学术

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The effect of work function during electron spectroscopy measurements in Scanning Field-Emission Microscopy

Published:2022-08 Issue: Volume:238 Page:113547
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Bodik Michal^ORCID,Walker Christopher^ORCID,Demydenko Maksym,Michlmayr Thomas,Bähler Thomas,Ramsperger Urs,Thamm Ann-Katrin,Tear Steve^ORCID,Pratt Andrew^ORCID,El-Gomati Mohamed,Pescia Danilo

Funder

European Commission Marie Sklodowska-Curie Actions

Seventh Framework Programme

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy;Zanin;Proc. R. Soc. A Math. Phys. Eng. Sci.,2016

2. Scanning probe energy loss spectroscopy;Palmer;Surf. Sci.,2002

3. Scanning probe energy loss spectroscopy below 50 nm resolution;Festy;Appl. Phys. Lett.,2004

4. Scanning probe energy loss spectroscopy: Angular resolved measurements on silicon and graphite surfaces;Eves;Appl. Phys. Lett.,2000

5. Scanning tunneling microscopy in the field-emission regime: Formation of a two-dimensional electron cascade;Werner;Appl. Phys. Lett.,2019

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