Atomic layer deposited Al2O3 as a protective overlayer for focused ion beam preparation of plan-view STEM samples-Reference-Cited by-同舟云学术

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Atomic layer deposited Al2O3 as a protective overlayer for focused ion beam preparation of plan-view STEM samples

Published:2022-09 Issue: Volume:239 Page:113562
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Gurrentz Joseph M.,Jarvis Karalee A.,Gearba-Dolocan Ioana R.,Rose Michael J^ORCID

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference60 articles.

1. Hybrid Organic/Inorganic Band-Edge Modulation of p-Si(111) Photoelectrodes: Effects of R, Metal Oxide, and Pt on H2 Generation;Seo;J. Am. Chem. Soc.,2015

2. Tuning the Photoelectrocatalytic Hydrogen Evolution of Pt-Decorated Silicon Photocathodes by the Temperature and Time of Electroless Pt Deposition;Fabre;Langmuir,2016

3. Evaluation of Pt, Ni, and Ni-Mo Electrocatalysts for Hydrogen Evolution on Crystalline Si Electrodes;McKone;Energy Environ. Sci.,2011

4. Photoelectrocatalysis and electrocatalysis on p-Silicon;Szklarczyk;J. Phys. Chem.,1984

5. Detailed Structural Examinations of Covalently Immobilized Gold Nanoparticles onto Hydrogen-Terminated Silicon Surfaces;Yamanoi;Chem. - A Europ. J.,2006

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic Layer Deposition of Boron‐Doped Al₂O₃ Dielectric Films;Advanced Materials Interfaces;2023-05-28

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