Ptychographic characterization of the wavefield in the focus of reflective hard X-ray optics-Reference-Cited by-同舟云学术

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Ptychographic characterization of the wavefield in the focus of reflective hard X-ray optics

Published:2010-03 Issue:4 Volume:110 Page:325-329
ISSN:0304-3991
Container-title:Ultramicroscopy
language:en
Short-container-title:Ultramicroscopy

Author:

Kewish Cameron M.,Thibault Pierre,Dierolf Martin,Bunk Oliver,Menzel Andreas,Vila-Comamala Joan,Jefimovs Konstantins,Pfeiffer Franz

Publisher

Elsevier BV

Subject

Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Fabrication of Fresnel zone plates for hard X-rays;Jefimovs;Microelectron. Eng.,2007

2. Hard X-ray nanoprobe based on refractive X-ray lenses;Schroer;Appl. Phys. Lett.,2005

3. Efficient focusing of hard X rays to 25nm by a total reflection mirror;Mimura;Appl. Phys. Lett.,2007

4. Efficient sub 100nm focusing of hard X rays;Hignette;Rev. Sci. Instrum.,2005

5. Nanometer linear focusing of hard X rays by a multilayer Laue lens;Kang;Phys. Rev. Lett.,2006

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1. Multilayer Kirkpatrick-Baez focusing mirrors with phase compensation for sub-20 nm focusing at the hard X-ray nanoprobe beamline of SSRF;Optics Express;2024-03-28

2. Extreme focusing of hard X-ray free-electron laser pulses enables 7 nm focus width and 1022 W cm−2 intensity;Nature Photonics;2024-03-15

3. Ultracompact mirror device for forming 20-nm achromatic soft-X-ray focus toward multimodal and multicolor nanoanalyses;Nature Communications;2024-02-07

4. Pulse-to-pulse field characterization at x-ray free-electron lasers using a speckle-correlation scattering matrix;Optica;2023-03-08

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