1. G. Willeke, in: J. Kanicki (Ed.), Amorphous and Microcrystalline Semiconductor Devices, vol. 1, Artech House, Norwood, 1992, p. 55
2. F. Finger, R. Carius, P. Hapke, L. Houben, M. Luysberg, M. Tzolov, in: J.M. Marshall, N. Kirov, A. Vavrek, J.M. Maud (Eds.), Future Directions in Thin Film Science and Technology, World Scientific, Singapore, 1996, p. 1
3. R. Carius, F. Finger, M. Luysberg, P. Hapke, U. Backhausen, in: J.M. Marshall, N. Kirov, A. Vavrek, J.M. Maud (Eds.), Future Directions in Thin Film Science and Technology, World Scientific, Singapore, 1996, p. 11
4. Annealing studies of the microcrystalline silicon system
5. H. Overhof, M. Otte, in: J.M. Marshall, N. Kirov, A. Vavrek, J.M. Maud (Eds.), Future Directions in Thin Film Science and Technology, World Scientific, Singapore, 1996, p. 23