Some indications of different film forming radicals in a-Si:H deposition by the glow discharge and thermocatalytic CVD processes
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
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5. H Out-Diffusion and Device Performance in n-i-p Solar Cells Utilizing High Temperature Hot Wire a-Si:H i-Layers
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5. Optimization of process parameters in a large-area hot-wire CVD reactor for the deposition of amorphous silicon (a-Si:H) for solar cell application with highly uniform material quality;Solar Energy Materials and Solar Cells;2002-07
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