Electronic properties of silicon thin films prepared by hot-wire chemical vapour deposition

Author:

Brüggemann R,Kleider J.P,Longeaud C,Mencaraglia D,Guillet J,Bourée J.E,Niikura C

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. a‐Si : H produced by high‐temperature thermal decomposition of silane

2. Catalytic Chemical Vapor Deposition (CTC-CVD) Method Producing High Quality Hydrogenated Amorphous Silicon

3. Polycrystalline silicon films obtained by hot-wire chemical vapour deposition

4. A.R. Middya, A. Lloret, J. Perrin, J. Huc, J.L. Moncel, J.Y. Parey, G. Rose, in: E.A. Schiff, M. Hack, A. Madan, A. Matsuda, M.J. Powell (Eds), Amorphous Silicon Technology – 1995, Mater. Res. Soc., Pittsburgh, 1995, p. 119

5. Amorphous and microcrystalline silicon by hot wire chemical vapor deposition

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