Effect of oxide treatment at the microcrystalline tunnel junction of a-Si:H/a-Si:H tandem cells-Reference-Cited by-同舟云学术

Effect of oxide treatment at the microcrystalline tunnel junction of a-Si:H/a-Si:H tandem cells

Published:2000-05 Issue: Volume:266-269 Page:1129-1133
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Rath J.K,Rubinelli F.A,Schropp R.E.I

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. J.K. Rath, C.H.M. van der Werf, F.A. Rubinelli, R.E.I. Schropp, in: Proceedings of the 25th IEEE PVSC, Washington, 1996, p. 1101

2. J. Yang, A. Banerjee, S. Guha, in: S. Wagner, M. Hack, E.A. Schiff, R. Schropp, I. Shimizu (Eds.), Amorphous and Microcrystalline Silicon Technology, vol. 467, 1997, p. 693

3. J.K. Rath, F.A. Rubinelli, R.E.I. Schropp, in: Proceedings of the 2nd World Conference and Exhibition on Photovoltaic Solar Energy Conversion, Viena, 1998, p. 812

4. A new recombination model for device simulation including tunneling

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