Excimer laser treatment for large surface-Reference-Cited by-同舟云学术

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Excimer laser treatment for large surface

Published:1997-09 Issue: Volume:218 Page:218-222
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Stehle Marc

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. Realization of a 1 kW XeCl Laser, GCL'92;Godard;SPIE 1810 Gas Flow and Chemical Lasers 372,1992

2. VEL 15, Second Generation of SOPRA's VEL industrial Excimer Laser, energy up to 20 J;Godard,1995

3. 60 J XeCl laser for Single Shot Excimer Laser Annealing;Godard,1996

4. Excimer Laser Annealing of Amorphous Silicon: Optimization and relation to the electrical properties of the polysilicon;Boher,1996

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1. Nanostructuring of GeTiO amorphous films by pulsed laser irradiation;Beilstein Journal of Nanotechnology;2015-04-07

2. Mechanism and control of crack generation in glass substrates during crystallization of a-Si Films by flash lamp annealing;Journal of Non-Crystalline Solids;2012-09

3. Characterization of Polycrystalline Si Films Produced by ArF Excimer Laser Irradiation;Materials Science Forum;2006-01

4. Surface morphology and recrystallization behavior of amorphous Si after ArF laser irradiation;SPIE Proceedings;2005-04-12

5. Phase stepping microscopy for rapid control of laser crystallization of Si for flat panel display applications;SPIE Proceedings;2003-05-16

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