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Ambient-dried low dielectric SiO2 aerogel thin film

Published:1997-12 Issue:2-3 Volume:221 Page:151-156
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Yang Hee-Sun,Choi Se-Young,Hyun Sang-Hoon,Park Hyung-Ho,Hong Jung-Kyun

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. S.P. Murarka, Metallization — The Theory and Practice for VLSI and ULSI, Butterworth-Heinemann, 1993.

2. Preparation of Low-Density Aerogels at Ambient Pressure

3. S. Wolf, Silicon Processing for the VLSI ERA, vol. 2: Process Integration, Lattice Press, California, 1990.

4. Spin coating: One‐dimensional model

5. Silica aerogel films at ambient pressure

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