Reactive sputtering and the use of anodes for optical coatings-Reference-Cited by-同舟云学术

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Reactive sputtering and the use of anodes for optical coatings

Published:1997-09 Issue: Volume:218 Page:54-57
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Hill Russell J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. Thin-film Optical Filters;Macleod,1986

2. Physical Vapor Deposition;Hill,1986

3. J.S. Chapin, ‘Sputtering process and apparatus’, US patent #4,166,018.

4. All oxide broad band antireflection coatings by reactive sputter deposition;Shulz,1993

5. Planar magnetron sputtering;Waits,1978

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of the decomposition of aqueous citratoperoxo-Ti(IV)-gel precursors for titania by means of TGA-MS and FTIR;Thermochimica Acta;2007-05

2. Influence of synthesis parameters on morphology and phase composition of porous titania layers prepared via water based chemical solution deposition;Journal of the European Ceramic Society;2007-01

3. Physical and Mechanical Properties of Hard Nanocomposite Films Prepared by Reactive Magnetron Sputtering;Nanostructured Coatings;2006

4. Multilayered Al2O3/SiO2 and TiO2/SiO2 coatings for glazed colored solar thermal collectors;Solar Energy Materials and Solar Cells;2005-11-15

5. Reactive magnetron sputtering of thin films: present status and trends;Thin Solid Films;2005-03

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